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SPIE Proceedings [SPIE SPIE 31st International Symposium on Advanced Lithography - San Jose, CA (Sunday 19 February 2006)] Metrology, Inspection, and Process Control for Microlithography XX - Defect metrology challenges for the 45-nm technology node and beyond
Patel, Dilip, Archie, Chas N., Hanrahan, Jeffrey, Lim, Kyuhong, Godwin, Milton, Figliozzi, Peter, Sheu, DaleVolume:
6152
Year:
2006
Language:
english
DOI:
10.1117/12.664190
File:
PDF, 1.01 MB
english, 2006