SPIE Proceedings [SPIE Photomask and Next Generation Lithography Mask Technology XIII - Yokohama, Japan (Tuesday 18 April 2006)] Photomask and Next-Generation Lithography Mask Technology XIII - Robust OPC technique using aerial image parameter
Oka, Mikio, Hoga, Morihisa, Suzuki, Shinichiro, Kawahara, Kazuyoshi, Tsuchiya, Kensuke, Ogawa, Kazuhisa, Ohnuma, HidetoshiVolume:
6283
Year:
2006
Language:
english
DOI:
10.1117/12.681821
File:
PDF, 532 KB
english, 2006