![](/img/cover-not-exists.png)
SPIE Proceedings [SPIE 26th Annual BACUS Symposium on Photomask Technology - Monterey, CA (Monday 18 September 2006)] Photomask Technology 2006 - A cost model comparing image qualification using test wafer and direct mask inspection
Bhattacharyya, Kaustuve, Martin, Patrick M., Naber, Robert J., Hazari, Viral, Sutherland, Doug, Higashiki, TatsuhikoVolume:
6349
Year:
2006
Language:
english
DOI:
10.1117/12.692948
File:
PDF, 215 KB
english, 2006