SPIE Proceedings [SPIE Advanced Lithography - San Jose, CA (Sunday 25 February 2007)] Emerging Lithographic Technologies XI - Application of the Energetiq EQ-10 electrodeless Z-Pinch EUV light source in outgassing and exposure of EUV photoresist
Blackborow, Paul A., Lercel, Michael J., Gustafson, Deborah S., Smith, Donald K., Besen, Matthew M., Horne, Stephen F., D'Agostino, Robert J., Minami, Youichi, Denbeaux, GregoryVolume:
6517
Year:
2007
Language:
english
DOI:
10.1117/12.711457
File:
PDF, 1.25 MB
english, 2007