SPIE Proceedings [SPIE Advanced Lithography - San Jose, CA (Sunday 25 February 2007)] Emerging Lithographic Technologies XI - Fidelity of rectangular patterns printed with 0.3-NA MET optics
Tanaka, Yuusuke, Lercel, Michael J., Kikuchi, Yukiko, Goo, DooHoon, Nishiyama, IwaoVolume:
6517
Year:
2007
Language:
english
DOI:
10.1117/12.711900
File:
PDF, 1.70 MB
english, 2007