SPIE Proceedings [SPIE Advanced Lithography - San Jose, CA (Sunday 25 February 2007)] Emerging Lithographic Technologies XI - Template flatness issue for UV curing nanoimprint lithography
Voisin, P., Lercel, Michael J., Jouve, A., Zelsmann, M., Gourgon, C., Boussey, J.Volume:
6517
Year:
2007
Language:
english
DOI:
10.1117/12.712032
File:
PDF, 450 KB
english, 2007