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SPIE Proceedings [SPIE 27th Annual BACUS Symposium on Photomask Technology - Monterey, CA (Monday 17 September 2007)] Photomask Technology 2007 - The improvement of OPC accuracy and stability by the model parameters' analysis and optimization
Chung, No-Young, Naber, Robert J., Kawahira, Hiroichi, Choi, Woon-Hyuk, Lee, Sung-Ho, Kim, Sung-Il, Lee, Sun-YongVolume:
6730
Year:
2007
Language:
english
DOI:
10.1117/12.746446
File:
PDF, 2.78 MB
english, 2007