SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 24 February 2008)] Emerging Lithographic Technologies XII - Quantitative measurement of outgas products from EUV photoresists
Tarrio, C., Schellenberg, Frank M., Benner, B. A., Vest, R. E., Grantham, S., Hill, S. B., Lucatorto, T. B., Hendricks, J. H., Abbott, P., Denbeaux, G., Mbanaso, C., Antohe, A., Orvek, K., Choi, K.-W.Volume:
6921
Year:
2008
Language:
english
DOI:
10.1117/12.772686
File:
PDF, 532 KB
english, 2008