SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 24 February 2008)] Optical Microlithography XXI - Double printing through the use of ion implantation
Samarakone, Nandasiri, Yick, Paul, Zawadzki, Mary, Choi, Sang-JunVolume:
6924
Year:
2008
Language:
english
DOI:
10.1117/12.774051
File:
PDF, 406 KB
english, 2008