SPIE Proceedings [SPIE Photomask Technology - Monterey, CA (Monday 6 October 2008)] Photomask Technology 2008 - Deflection unit for multi-beam mask making
Letzkus, Florian, Kawahira, Hiroichi, Zurbrick, Larry S., Butschke, Joerg, Irmscher, Mathias, Jurisch, Michael, Klingler, Wolfram, Platzgummer, Elmar, Klein, Christof, Loeschner, Hans, Springer, ReinhVolume:
7122
Year:
2008
Language:
english
DOI:
10.1117/12.801401
File:
PDF, 1.41 MB
english, 2008