SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 22 February 2009)] Metrology, Inspection, and Process Control for Microlithography XXIII - Quantitative measurement of voltage contrast in SEM images for in-line resistance inspection of wafers manufactured for SRAM
Matsui, Miyako, Allgair, John A., Raymond, Christopher J., Odaka, Takahiro, Nagaishi, Hiroshi, Sakurai, KoichiVolume:
7272
Year:
2009
Language:
english
DOI:
10.1117/12.812949
File:
PDF, 351 KB
english, 2009