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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 22 February 2009)] Optical Microlithography XXII - Achieving overlay budgets for double patterning
Hazelton, Andrew J., Levinson, Harry J., Dusa, Mircea V., Magome, Nobutaka, Wakamoto, Shinji, Tokui, Akira, Lapeyre, Céline, Barnola, Sébastien, Jullien, Guillaume, Salvetat, VincentVolume:
7274
Year:
2009
Language:
english
DOI:
10.1117/12.813599
File:
PDF, 704 KB
english, 2009