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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 22 February 2009)] Metrology, Inspection, and Process Control for Microlithography XXIII - Alignment method of self-aligned double patterning process
Tsai, Meng-Feng, Allgair, John A., Raymond, Christopher J., Lai, Jun-Cheng, Chang, Yi-Shiang, Lin, Chia-ChiVolume:
7272
Year:
2009
Language:
english
DOI:
10.1117/12.813641
File:
PDF, 438 KB
english, 2009