SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 22 February 2009)] Optical Microlithography XXII - Model-based retarget for 45nm node and beyond
Yang, Ellyn, Levinson, Harry J., Dusa, Mircea V., Li, Cheng He, Kang, Xiao Hui, Guo, EricVolume:
7274
Year:
2009
Language:
english
DOI:
10.1117/12.814085
File:
PDF, 288 KB
english, 2009