SPIE Proceedings [SPIE Photomask and NGL Mask Technology XVII - Yokohama, Japan (Tuesday 13 April 2010)] Photomask and Next-Generation Lithography Mask Technology XVII - Fine pixel SEM image for EUV mask pattern 3D quality assurance based on lithography simulation
Yamanaka, Eiji, Hosono, Kunihiro, Itoh, Masamitsu, Kato, Masaya, Ueno, Kusuo, Hayashi, Kyouhei, Higuchi, Akira, Hayashi, NaoyaVolume:
7748
Year:
2010
Language:
english
DOI:
10.1117/12.868631
File:
PDF, 459 KB
english, 2010