SPIE Proceedings [SPIE SPIE Photomask Technology -...

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SPIE Proceedings [SPIE SPIE Photomask Technology - Monterey, California (Monday 19 September 2011)] Photomask Technology 2011 - A new source optimization approach for 2X node logic

Iwase, Kazuya, Maurer, Wilhelm, Abboud, Frank E., De Bisschop, Peter, Laenens, Bart, Li, Zhipan, Gronlund, Keith, van Adrichem, Paul, Hsu, Stephen
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Volume:
8166
Year:
2011
Language:
english
DOI:
10.1117/12.898749
File:
PDF, 1.65 MB
english, 2011
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