SPIE Proceedings [SPIE SPIE Photomask Technology - Monterey, California (Monday 19 September 2011)] Photomask Technology 2011 - Double patterning for 56 nm pitch test designs using inverse lithography
Dam, Thuc, Maurer, Wilhelm, Abboud, Frank E., Gleason, Robert, Rissman, Paul, Sinn, RobertVolume:
8166
Year:
2011
Language:
english
DOI:
10.1117/12.900852
File:
PDF, 1.49 MB
english, 2011