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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 12 February 2012)] Advanced Etch Technology for Nanopatterning - How much further can lithography process windows be improved?
Hockey, Mary Ann, Lin, Qin, Calderas, Eric, Zhang, YingVolume:
8328
Year:
2012
Language:
english
DOI:
10.1117/12.915672
File:
PDF, 2.48 MB
english, 2012