SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 12 February 2012)] Optical Microlithography XXV - Characterization and decomposition of self-aligned quadruple patterning friendly layout
Zhang, Hongbo, Du, Yuelin, Wong, Martin D. F., Topaloglu, Rasit O., Conley, WillVolume:
8326
Year:
2012
Language:
english
DOI:
10.1117/12.918078
File:
PDF, 872 KB
english, 2012