SPIE Proceedings [SPIE Microlithography Conference - Santa Clara, CA (Monday 2 March 1987)] Advances in Resist Technology and Processing IV - Application Of Halogenated Polymethylstyrenes To X-Ray Resists
Yamaoka, Tsuguo, Koshiba, Mitsunobu, Kamoshida, Yoichi, Takahashi, Hideo, Harita, Yoshiyuki, Bowden, Murrae J.Volume:
771
Year:
1987
Language:
english
DOI:
10.1117/12.940330
File:
PDF, 7.10 MB
english, 1987