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SPIE Proceedings [SPIE Microlithography Conference - Santa Clara, CA (Monday 2 March 1987)] Lasers in Microlithography - Half-Micron KrF Excimer Laser Stepper Lithography With New Resist And Water-Soluble Contrast Enhanced Materials
Endo, Masayuki, Sasago, Masaru, Hirai, Yoshihiko, Ogawa, Kazufumi, Ishihara, Takeshi, Batchelder, John S., Ehrlich, Daniel J., Tsao, Jeff Y.Volume:
774
Year:
1987
Language:
english
DOI:
10.1117/12.940399
File:
PDF, 6.50 MB
english, 1987