![](/img/cover-not-exists.png)
SPIE Proceedings [SPIE Medical Imaging II - Newport Beach, CA (Sunday 31 January 1988)] Electron-Beam, X-Ray, and Ion Beam Technology: Submicrometer Lithographies VII - Fully Scaled 0.5 Micron CMOS Technology Using Variable Shaped Electron Beam Lithography
Coane, Philip, Rudeck, Paul, Wang, Li-Kong, Wilson, Alan, Hohn, Fritz, Yanof, Arnold W.Volume:
923
Year:
1988
Language:
english
DOI:
10.1117/12.945656
File:
PDF, 15.14 MB
english, 1988