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SPIE Proceedings [SPIE 1989 Microlithography Conferences - San Jose, CA (Monday 27 February 1989)] Advances in Resist Technology and Processing VI - Sensitive Electron Beam Resist Systems Based On Acid-Catalyzed Deprotection
Ito, Hiroshi, Pederson, Lester A., Chiong, Kaolin N., Sonchik, Susan, Tsai, Cecilia, Reichmanis, ElsaVolume:
1086
Year:
1989
Language:
english
DOI:
10.1117/12.953013
File:
PDF, 5.24 MB
english, 1989