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SPIE Proceedings [SPIE SPIE'S 1993 Symposium on Microlithography - San Jose, CA (Sunday 28 February 1993)] Advances in Resist Technology and Processing X - New simplified positive-tone DESIRE process using liquid phase silylation in DUV lithography
Baik, Ki-Ho, Ronse, Kurt G., Van den Hove, Luc, Roland, Bruno, Hinsberg, William D.Volume:
1925
Year:
1993
Language:
english
DOI:
10.1117/12.154765
File:
PDF, 1.20 MB
english, 1993