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SPIE Proceedings [SPIE SPIE'S 1993 Symposium on Microlithography - San Jose, CA (Sunday 28 February 1993)] Advances in Resist Technology and Processing X - Evaluation of liquid silylated resists for 213-nm exposure
Hutchinson, John M., Kalpakjian, K., Schenker, Robert, Oldham, William G., Hinsberg, William D.Volume:
1925
Year:
1993
Language:
english
DOI:
10.1117/12.154777
File:
PDF, 708 KB
english, 1993