SPIE Proceedings [SPIE SPIE's 1994 Symposium on Microlithography - San Jose, CA (Sunday 27 February 1994)] Optical/Laser Microlithography VII - Comprehensive evaluation of major phase-shift mask technologies for isolated gate structures in logic designs
Liebmann, Lars W., Newman, Thomas H., Ferguson, Richard A., Martino, Ronald M., Molless, Antoinette F., Neisser, Mark O., Weed, J. Tracy, Brunner, Timothy A.Volume:
2197
Year:
1994
Language:
english
DOI:
10.1117/12.175455
File:
PDF, 916 KB
english, 1994