SPIE Proceedings [SPIE Photomask Japan '94 - Kawasaki City, Kanagawa, Japan (Friday 22 April 1994)] Photomask and X-Ray Mask Technology - Fabrication of reliable x-ray mask using high-temperature deposited SiN membrane by low-pressure chemical vapor deposition system
Ohta, Tsuneaki, Kumar, R., Noda, Shuichi, Kasai, Masanori, Hoga, Hiroshi, Yoshihara, HideoVolume:
2254
Year:
1994
Language:
english
DOI:
10.1117/12.191942
File:
PDF, 542 KB
english, 1994