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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 24 February 2013)] Advances in Resist Materials and Processing Technology XXX - Calculating development parameters for chemically amplified resists by the film-reducing method
Sekiguchi, Atsushi, Sensu, Yoshihisa, Somervell, Mark H.Volume:
8682
Year:
2013
Language:
english
DOI:
10.1117/12.2008791
File:
PDF, 506 KB
english, 2013