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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 24 February 2013)] Advances in Resist Materials and Processing Technology XXX - Negative tone imaging process and materials for EUV lighography
Tarutani, Shinji, Nihashi, Wataru, Hirano, Shuuji, Yokokawa, Natsumi, Takizawa, Hiroo, Somervell, Mark H.Volume:
8682
Year:
2013
Language:
english
DOI:
10.1117/12.2011384
File:
PDF, 2.86 MB
english, 2013