SPIE Proceedings [SPIE Microlithography '90, 4-9 Mar, San Jose - San Jose, CA (Sunday 4 March 1990)] Advances in Resist Technology and Processing VII - Sidewall profile control through processing and dye additives
Shalom, Eitan, Johnson, Donald W., Hale, Kelly, Pebbles, Terry, Curtis, William B., Watts, Michael P. C.Volume:
1262
Year:
1990
Language:
english
DOI:
10.1117/12.20115
File:
PDF, 1.57 MB
english, 1990