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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 23 February 2014)] Metrology, Inspection, and Process Control for Microlithography XXVIII - In cleanroom, sub-ppb real-time monitoring of volatile organic compounds using proton-transfer reaction/time of flight/mass spectrometry
Cain, Jason P., Sanchez, Martha I., Hayeck, Nathalie, Maillot, Philippe, Vitrani, Thomas, Pic, Nicolas, Wortham, Henri, Gligorovski, Sasho, Temime-Roussel, Brice, Mizzi, Aurélie, Poulet, IrèneVolume:
9050
Year:
2014
Language:
english
DOI:
10.1117/12.2045579
File:
PDF, 2.92 MB
english, 2014