SPIE Proceedings [SPIE SPIE's 1995 Symposium on Microlithography - Santa Clara, CA (Sunday 19 February 1995)] Electron-Beam, X-Ray, EUV, and Ion-Beam Submicrometer Lithographies for Manufacturing V - EBR900 processes in e-beam and laser beam lithographies for photomask fabrication
Kurihara, Masa-aki, Komada, Minoru, Moro-oka, Hisashi, Hayashi, Naoya, Sano, Hisatake, Warlaumont, John M.Volume:
2437
Year:
1995
Language:
english
DOI:
10.1117/12.209164
File:
PDF, 887 KB
english, 1995