SPIE Proceedings [SPIE SPIE's 1995 Symposium on Microlithography - Santa Clara, CA (Sunday 19 February 1995)] Integrated Circuit Metrology, Inspection, and Process Control IX - Atomic force microscope (AFM) analysis of photoresist test structures for use in SEM as in-house linewidth standards
Chernoff, Donald A., Bennett, Marylyn H.Volume:
2439
Year:
1995
Language:
english
DOI:
10.1117/12.209223
File:
PDF, 1.01 MB
english, 1995