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SPIE Proceedings [SPIE SPIE's 1995 Symposium on Microlithography - Santa Clara, CA (Sunday 19 February 1995)] Advances in Resist Technology and Processing XII - Thermal rearrangement of novolak resins used in microlithography
Hardy, Ricky, Zampini, Anthony, Monaghan, Michael J., O'Leary, Michael J., Cardin, William J., Eugster, Timothy J., Allen, Robert D.Volume:
2438
Year:
1995
Language:
english
DOI:
10.1117/12.210390
File:
PDF, 345 KB
english, 1995