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SPIE Proceedings [SPIE Microlithography '97 - Santa Clara, CA (Monday 10 March 1997)] Metrology, Inspection, and Process Control for Microlithography XI - High-precision calibration of a scanning probe microscope (SPM) for pitch and overlay measurements
Chernoff, Donald A., Lohr, Jason D., Hansen, Douglas P., Lines, Michael, Jones, Susan K.Volume:
3050
Year:
1997
Language:
english
DOI:
10.1117/12.275913
File:
PDF, 848 KB
english, 1997