SPIE Proceedings [SPIE Photomask Japan '97 - Kawasaki City, Japan (Thursday 17 April 1997)] Photomask and X-Ray Mask Technology IV - Proposal for pattern layout rule in application of alternating phase-shift mask
Nakae, Akihiro, Nakao, Shuji, Matsui, Yasuji, Aizaki, NaoakiVolume:
3096
Year:
1997
Language:
english
DOI:
10.1117/12.277281
File:
PDF, 427 KB
english, 1997