SPIE Proceedings [SPIE 23rd Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 22 February 1998)] Emerging Lithographic Technologies II - 100-nm CMOS gates patterned with 3 sigma below 10 nm
Liu, Hua-Yu, Diaz, Carlos H., Chi, Chiu, Kavari, R., Cheng, Peng, Cao, Min, Gleason, Robert E., Doyle, Brian S., Greene, Wayne M., Ray, G., Vladimirsky, YuliVolume:
3331
Year:
1998
Language:
english
DOI:
10.1117/12.309593
File:
PDF, 3.05 MB
english, 1998