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SPIE Proceedings [SPIE Micromachining and Microfabrication - Santa Clara, CA (Sunday 20 September 1998)] Micromachining and Microfabrication Process Technology IV - CMOS compatibiltity of high-aspect-ratio micromachining (HARM) in bonded silicon-on-insulator (BSOI)
McNie, Mark E., King, David O., Smith, James H.Volume:
3511
Year:
1998
Language:
english
DOI:
10.1117/12.324311
File:
PDF, 1.41 MB
english, 1998