SPIE Proceedings [SPIE Photomask Japan '98 Symposium on Photomask and X-Ray Mask Technology V - Kawasaki City, Japan (Thursday 9 April 1998)] Photomask and X-Ray Mask Technology V - Present status of ArF lithography development and mask technology
Morimoto, Hiroaki, Ohtsuka, Hiroshi, Aizaki, NaoakiVolume:
3412
Year:
1998
Language:
english
DOI:
10.1117/12.328844
File:
PDF, 374 KB
english, 1998