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SPIE Proceedings [SPIE Microlithography '99 - Santa Clara, CA (Sunday 14 March 1999)] Metrology, Inspection, and Process Control for Microlithography XIII - CD error budget analysis for 0.18-μm inlaid trench lithography
Postnikov, Sergei V., Sturtevant, John L., Lucas, Kevin D., Fu, Chong-Cheng, Singh, BhanwarVolume:
3677
Year:
1999
Language:
english
DOI:
10.1117/12.350827
File:
PDF, 1.26 MB
english, 1999