SPIE Proceedings [SPIE Photomask Technology - Monterey, CA (Wednesday 13 September 2000)] 20th Annual BACUS Symposium on Photomask Technology - Localized resist heating due to electron-beam patterning during photomask fabrication
Wei, Alexander C., Beckman, William A., Engelstad, Roxann L., Mitchell, John W., Phung, Thanh N., Zheng, Jun-Fei, Grenon, Brian J., Dao, Giang T.Volume:
4186
Year:
2001
Language:
english
DOI:
10.1117/12.410727
File:
PDF, 1.12 MB
english, 2001