SPIE Proceedings [SPIE 26th Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 25 February 2001)] Optical Microlithography XIV - Simulation of exposure process in complex nonplanar 2D/3D resist-substrate structures
Manuylov, Vadim, Temkin, Misha, Progler, Christopher J.Volume:
4346
Year:
2001
Language:
english
DOI:
10.1117/12.435692
File:
PDF, 441 KB
english, 2001