SPIE Proceedings [SPIE 26th Annual International Symposium...

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SPIE Proceedings [SPIE 26th Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 25 February 2001)] Optical Microlithography XIV - Simulation of exposure process in complex nonplanar 2D/3D resist-substrate structures

Manuylov, Vadim, Temkin, Misha, Progler, Christopher J.
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Volume:
4346
Year:
2001
Language:
english
DOI:
10.1117/12.435692
File:
PDF, 441 KB
english, 2001
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