SPIE Proceedings [SPIE 26th Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 25 February 2001)] Metrology, Inspection, and Process Control for Microlithography XV - Silicon single atom steps as AFM height standards
Dixson, Ronald G., Orji, Ndubuisi G., Fu, Joseph, Tsai, Vincent, Williams, Ellen D., Kacker, Raghu, Vorburger, Theodore V., Edwards, Hal L., Cook, Debra, West, Paul E., Nyffenegger, Ralph, Sullivan, NVolume:
4344
Year:
2001
Language:
english
DOI:
10.1117/12.436739
File:
PDF, 192 KB
english, 2001
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