SPIE Proceedings [SPIE Micro - DL tentative - San Jose, CA (Friday 1 March 1991)] Electron-Beam, X-Ray, and Ion-Beam Submicrometer Lithographies for Manufacturing - Novel toroidal mirror enhances x-ray lithography beamline at the Center for X-ray Lithography
Cole, Richard K., Cerrina, Franco, Peckerar, Martin C.Volume:
1465
Year:
1991
Language:
english
DOI:
10.1117/12.47348
File:
PDF, 686 KB
english, 1991