SPIE Proceedings [SPIE SPIE's 27th Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 3 March 2002)] Advances in Resist Technology and Processing XIX - Performance of vinyl ether cross-linkers on resist for 193-nm lithography
Lee, JongSoo, Suzuki, Hideo, Odoi, Keisuke, Miyagawa, Nobukazu, Takahara, Shigeru, Yamaoka, Tsuguo, Fedynyshyn, Theodore H.Volume:
4690
Year:
2002
Language:
english
DOI:
10.1117/12.474254
File:
PDF, 615 KB
english, 2002