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SPIE Proceedings [SPIE Photomask and Next Generation Lithography Mask Technology IX - Yokohama, Japan (Tuesday 23 April 2002)] Photomask and Next-Generation Lithography Mask Technology IX - Pellicle-induced distortions in advanced photomasks
Fujita, Minoru, Akiyama, Masaya, Kondo, Masahiro, Nakagawa, Hiroaki, Tanzil, Daniel, Eschbach, Florence O., Cotte, Eric P., Engelstad, Roxann L., Lovell, Edward G., Kawahira, HiroichiVolume:
4754
Year:
2002
Language:
english
DOI:
10.1117/12.476974
File:
PDF, 228 KB
english, 2002