SPIE Proceedings [SPIE Microlithography 2004 - Santa Clara, CA (Sunday 22 February 2004)] Advances in Resist Technology and Processing XXI - Behavior of chemically amplified resist defects in TMAH solution: III
Ono, Yuko, Sturtevant, John L., Shimoaoki, Takeshi, Naito, Ryoichiro, Kitano, JunichiVolume:
5376
Year:
2004
Language:
english
DOI:
10.1117/12.534982
File:
PDF, 513 KB
english, 2004