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SPIE Proceedings [SPIE Microlithography 2004 - Santa Clara, CA (Sunday 22 February 2004)] Optical Microlithography XVII - Accurate gate CD control through the full-chip area using the dual model in the model-based OPC
Hong, Ji-Suk, Smith, Bruce W., Park, Chul-Hong, Kim, Dong-Hyun, Choi, Soo-Han, Ban, Yong-Chan, Kim, Yoo-Hyon, Yoo, Moon-Hyun, Kong, Jeong-TaekVolume:
5377
Year:
2004
Language:
english
DOI:
10.1117/12.535027
File:
PDF, 228 KB
english, 2004