![](/img/cover-not-exists.png)
SPIE Proceedings [SPIE Microlithography 2004 - Santa Clara, CA (Sunday 22 February 2004)] Advances in Resist Technology and Processing XXI - Reactive dissolution kinetics of lithographic copolymers
Hinsberg, William, Sturtevant, John L., Houle, Frances A., Ito, HiroshiVolume:
5376
Year:
2004
Language:
english
DOI:
10.1117/12.535599
File:
PDF, 143 KB
english, 2004