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SPIE Proceedings [SPIE Photomask and Next Generation Lithography Mask Technology XI - Yokohama, Japan (Wednesday 14 April 2004)] Photomask and Next-Generation Lithography Mask Technology XI - Photomask ADI, AEI, and QA measurements using normal incidence optical CD metrology
Apak, Ebru, Tanabe, Hiroyoshi, Sarathy, T. P., McGahan, William A., Rovira, Pablo I., Hoobler, Ray J.Volume:
5446
Year:
2004
Language:
english
DOI:
10.1117/12.557809
File:
PDF, 201 KB
english, 2004